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DC Field | Value | Language |
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dc.contributor.author | Desai, M. D. | |
dc.contributor.author | Bhatt, C. M. | |
dc.contributor.author | Thakrar, Vikesh | |
dc.contributor.author | Adhyaru, D. M. | |
dc.date.accessioned | 2023-04-20T11:06:24Z | - |
dc.date.available | 2023-04-20T11:06:24Z | - |
dc.date.issued | 2004 | |
dc.identifier.citation | International Conference on Instrumentation (INCON-2004) | en |
dc.identifier.uri | http://10.1.7.192:80/jspui/handle/123456789/11634 | - |
dc.description.abstract | A methodology for the implementation of a control & monitoring system based on PLD technology is implemented here. This technology is designed for the plasma nitriding process. FPGA based technology helps in designing dynamic system with parallel processing functionality. The main advantage of such devices is that its structure is not fixed and may be varied depending on the currently used control algorithm. Different signal processing functional modules are defined for each signal to be processed in parallel on FPGA chip, which are interactively interconnected in order to reduce the size and to improve the performance of the system. The purpose of the project is the development of the controller for controlling the three process variables; Temperature, Pressure and Voltage; simultaneously. | en |
dc.relation.ispartofseries | ITFIC002-3 | en |
dc.subject | IC Faculty Paper | en |
dc.subject | Faculty Paper | en |
dc.subject | ITFIC002 | en |
dc.subject.ddc | INCON | |
dc.subject.ddc | INCON-2004 | |
dc.title | FPGA based Process Controller | en |
dc.type | Faculty Papers | en |
Appears in Collections: | Faculty Papers, E&I |
Files in This Item:
File | Description | Size | Format | |
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ITFIC002-3.pdf | ITFIC002-3 | 183.98 kB | Adobe PDF | ![]() View/Open |
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