Please use this identifier to cite or link to this item: http://10.1.7.192:80/jspui/handle/123456789/5989
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dc.contributor.authorMehta, Hardik-
dc.date.accessioned2015-08-12T07:48:59Z-
dc.date.available2015-08-12T07:48:59Z-
dc.date.issued2015-06-01-
dc.identifier.urihttp://hdl.handle.net/123456789/5989-
dc.description.abstractIn this project, analysis on electromagnetic repulsion force for enhancement in repulsion threshold current in MCCB. Current flow between moving contact and fixed contact are repulsive nature due to structure of contact system. Due to current concentration, magnetic flux density between two contacts produces electromagnetic repulsion force. Repulsion force acting to separate contacts. This project will be initiated by carrying out detailed study of the factors and design constraints related to Irp of the MCCB. Present design will be analysed on FEA tools like JMAG/ANSYS Maxwell 3D to find out limitation in present design. Based on the finding of detailed study and simulation results new concepts for contact system of the MCCB will generated. Concepts will be developed in Pro-E software for improvement in Irp. Proposed concept will be finalized by simulation on JMAG/ ANSYS Maxwell 3D software and mathematical modelling. Prototypes of the selected concept will practically validated on MCCB. After successful completion of design validation, proposed design will be freezed for improvement as mentioned in the title.en_US
dc.publisherInstitute of Technologyen_US
dc.relation.ispartofseries13MEEE08;-
dc.subjectElectrical 2013en_US
dc.subjectProject Report 2013en_US
dc.subjectElectrical Project Reporten_US
dc.subjectProject Reporten_US
dc.subject13MEEen_US
dc.subject13MEEEen_US
dc.subject13MEEE08en_US
dc.subjectEPSen_US
dc.subjectEPS 2013en_US
dc.subjectEE (EPS)en_US
dc.subjectElectrical Power Systemsen_US
dc.titleAnalysis on Electromagnetic Repulsion force for Enhancement in Repulsion Threshold Current (Irp) of Contact System of 250 A Frame MCCBen_US
dc.typeDissertationen_US
Appears in Collections:Dissertation, EE (EPS)

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