Please use this identifier to cite or link to this item: http://10.1.7.192:80/jspui/handle/123456789/6654
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dc.contributor.authorShah, Hardik-
dc.date.accessioned2016-07-15T07:49:48Z-
dc.date.available2016-07-15T07:49:48Z-
dc.date.issued2016-06-01-
dc.identifier.urihttp://hdl.handle.net/123456789/6654-
dc.description.abstractLMC (Lithographic Manufacturing Check) is the process which involves the use of a template to print circuit pattern on actual device.LMC is one of the process which comes under OPC (Optical Proximity Correction).Main Objective of Optical Proximity Correction is to find out defects and making required correction on it before actual printing start on wafer.OPC is generally works on different nano meter technology and via simulating result of chip it can find out defects before actual printing on wafer start.Due to whole process of OPC it can improve yield of the data which leads to improvement in overall cost,time and effort for actual manufacturing.en_US
dc.publisherInstitute of Technologyen_US
dc.relation.ispartofseries14MCEC24;-
dc.subjectComputer 2014en_US
dc.subjectProject Report 2014en_US
dc.subjectComputer Project Reporten_US
dc.subjectProject Reporten_US
dc.subject14MCEen_US
dc.subject14MCECen_US
dc.subject14MCEC24en_US
dc.titleComputation Lithography Hotspot Verificationen_US
dc.typeDissertationen_US
Appears in Collections:Dissertation, CE

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