Design and Development of Modified Kaufman Ion-Source

Abstract

Kaufman ion source is most important machine for the industrial applications like etching, coating, polishing, ion implantation, material modification, etc. Existing Kaufman ion source has several difficulties like periodic removal of cathode filament approximately after ten hours of use and change of gaskets at the time of replacement of the cathode filament. Due to these problems operation became time consuming and tedious, which will deteriorate the efficiency of the system. In order to achieve trouble free operations and improvement in efficiency, modification in existing Kaufman ion source is highly required. The aim of the present work is to redesign and modify Kaufman ion source such a way that easy removal of cathode filament can be taken place. To modify the ion source housing such that it is directly clamp with flange and to design a cathode filament support.