IR @ Nirma University
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http://10.1.7.192:80/jspui/handle/123456789/6654| Title: | Computation Lithography Hotspot Verification |
| Authors: | Shah, Hardik |
| Keywords: | Computer 2014 Project Report 2014 Computer Project Report Project Report 14MCE 14MCEC 14MCEC24 |
| Issue Date: | 1-Jun-2016 |
| Publisher: | Institute of Technology |
| Series/Report no.: | 14MCEC24; |
| Abstract: | LMC (Lithographic Manufacturing Check) is the process which involves the use of a template to print circuit pattern on actual device.LMC is one of the process which comes under OPC (Optical Proximity Correction).Main Objective of Optical Proximity Correction is to find out defects and making required correction on it before actual printing start on wafer.OPC is generally works on different nano meter technology and via simulating result of chip it can find out defects before actual printing on wafer start.Due to whole process of OPC it can improve yield of the data which leads to improvement in overall cost,time and effort for actual manufacturing. |
| URI: | http://hdl.handle.net/123456789/6654 |
| Appears in Collections: | Dissertation, CE |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 14MCEC24.pdf | 14MCEC24 | 2 MB | Adobe PDF |  View/Open |
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