Please use this identifier to cite or link to this item: http://10.1.7.192:80/jspui/handle/123456789/6952
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dc.contributor.authorJoshi, Jagrut-
dc.date.accessioned2016-09-02T09:05:18Z-
dc.date.available2016-09-02T09:05:18Z-
dc.date.issued2016-06-01-
dc.identifier.urihttp://hdl.handle.net/123456789/6952-
dc.description.abstractWith increase in design complexity and stringent Time to Market (TTM) requirements, it is important that productivity improvement measures are taken to help designers to be in pace with the demands. At each phase of the design there are utilities which help improve the productivity by incorporating design automation and information feed forwarding. This project is aimed at enabling an electrically aware backend design ow which will try to improve the productivity of Mask Designers by feed forwarding electrical parameters early in the design ow so that the number of iterations in the backend design ow is minimized, and better turnaround time is obtained.en_US
dc.publisherInstitute of Technologyen_US
dc.relation.ispartofseries14MECV08;-
dc.subjectEC 2014en_US
dc.subjectProject Reporten_US
dc.subjectProject Report 2014en_US
dc.subjectEC Project Reporten_US
dc.subjectEC (VLSI)en_US
dc.subjectVLSIen_US
dc.subjectVLSI 2014en_US
dc.subject14MECen_US
dc.subject14MECVen_US
dc.subject14MECV08en_US
dc.titleElectrically Aware Design Flow for Sub-micron Technologiesen_US
dc.typeDissertationen_US
Appears in Collections:Dissertation, EC (VLSI)

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